- Az400k developer sds 9. of dissolved photoresist. 70 Meister Avenue Somerville, NJ 08876 Telephone NO. merckgroup. box 3700, 70 meister avenue somerville, nj 08876-1258 telephone numbers: emergency-chemtrec: (800) 424-9300 product safety information: (908) 429-3593 customer service: (800) 515-4164 product name: az(r) 400k developer synonyms: none msds no AZ 400k developer_TDS. Other hazards The following percentage of the mixture consists of ingredient(s) with unknown acute toxicity: AZ 400k developer_MSDS - Free download as PDF File (. 1 Classification of the substance or mixture Classification (REGULATION (EC) No 1272/2008) Corrosive to metals, Category 1 AZ 400K DEVELOPER (US) Page 1 Substance key: BBG7070 Revision Date: 01/10/2005 Version : 2 - 2 / USA Date of printing :03/10/2005 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. : SXR084862 Version 54 Revision Date 14. AZ® 100 Remover, TechniStrip P1316) Thinner and edge bead remover: AZ® EBR Solvent or PGMEA Developers If AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications. Redirect You have accessed https://www. AZ 400K Developers are available in multiple dilu- MSDS: Safety Data Sheet AZ ® 400K 1:4 Developer english Safety Data Sheet AZ ® 400K 1:4 Developer german. Baker BTS-220; Bis(diethylamino) silane (BDEAS) BOE Buffered Oxide Etch 6:1; Boron Trichloride (BCl 3) Brass; Bright Electroless Gold; γ-Butyrolactone; Back to the top. : 800-515-4164 Information on the substance/preparation AZ® 400K Developer is a buffered, KOH based developer formulation for many positive and image reversal resists. We are a leading supplier to the global Life Science industry with solutions and services for research, biotechnology development and production, and pharmaceutical drug therapy development and production. SDS Database; L-Edit design; Photoresist Profiles for DRIE S1827 and AZ4620 ; PEALD and ALD SOP; TiW_Stress_Control_2. 255891) 1. 009958 Cauchy C (µm4) 7. AZ. This developer may be used for both spray and immersion development pro-cesses. 化學藥品之msds. Replenish the developer periodically, perhaps once a shift or when developer activity. ®. o. AZ ® ECI 3027 High Resolution with Broad Process Window . Keep away from heat, sparks, open flames and hot surfaces; Take precautionary measures against static discharge AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. wet etching or plating and a lower photo active compound Developers containing metal ions such as the NaOH-based AZ ® 351B or the KOH-based AZ ® 400K are generally much cheaper than metal ion-free TMAH-based developers, with no fundamental difference in their performance or capacity. 16e-04 n @ 633nm 1. I AZ. Disposal: AZ 400K DEVELOPER (US) Substance key: BBG7070 REVISION DATE: 08/02/2005 Version 1 Print Date: 08/02/2005 1/6 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. MIF developers not recommended. AZ® Developer and AZ 400K developer are supplied as concentrates or prediluted. General Information. 0 to 9µm (single coat). 2 Revision Date: 17. Spray or immersion developing in AZ 400K series developers is recommended. Processing (continued) Equipment Compatibility May 12, 2006 · SDS management, distribution & revision solutions - for every budget. IF exposed or if you feel unwell: Call a POISON CENTER or doctor/ physician. This developer is recommended for use with most thick DNQ type photoresists and is available as a concentrate or pre-diluted with DI water in process ready 1:3 (AZ 400K 1:3) or 1:4 (AZ 400K 1:4) ratios. Items in this series: AZ 3312 Photoresist (Gallon) AZ 3318D Photoresist (Gallon) AZ 3330F Photoresist (Gallon) I would like more information about AZ 3300 Photoresists! Soft Bake: 90-105C (60s) Expose: g-line/i-line/h-line AZ 400K DEVELOPER (US) Substance key: BBG7070 REVISION DATE: 08/02/2005 Version 1 Print Date: 08/02/2005 1/6 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. Chemical Product and Company Identification 2 AZ 400 K Developer Substance No. merck-performance-materials. Plating bath lives are maximized thanks to P4000's unique PAC chemistry which prevents leaching of the DNQ. MSDS: BKNKB; Manufacturer: AMERICAN HOECHST CORP; Product Name: AZ 400K DEVELOPER National Stock Number: 6750-00N014979; MSDS: Sicherheitsdatenblatt AZ® 400K 1:4 Developer englisch Sicherheitsdatenblatt AZ® 400K 1:4 Developer deutsch TDS: Technisches Datenblatt AZ® 400K 1:4 Developer englisch Information AZ® 400K 1:4 Developer englisch Anwendungshinweis: Entwicklung von Fotolack englisch Entwicklung von Fotolack deutsch AZ ® MIR 701 (29CPS) High Resolution and Temperature Stability . AZ ® 400K is a buffered po-tassium-based developer that provides the process latitude associated with inorganic developers while minimizing the risk AZ 400K developers (AZ 400K 1:4 or AZ 400K 1:3) or AZ 421K developer. MNTC Rates Effective 6-1-2023; Pay My Bill; Expand Contact Us Submenu Contact Us. 顯影液 az 400k. AZ 400K 1:4 provides improved devel-oper selectivity for thinner films. 2018 SDS Number: 70MDGM697328 2 / 9 for several minutes. AZ 400K 1:3 or AZ 421K (unbuffered) are recommended for resist film thicknesses above 12µm. Clear, colorless liquid. TDS: Technisches Datenblatt AZ ® 400K 1:4 Developer englisch Information AZ ® 400K 1:4 Developer englisch. AZ 400K DEVELOPER DILUTED 1:4 Substance No. 7 Revision Date 09/24/2012 Print Date 09/24/2012 1 / 10 SECTION 1. The AZ® 726 MIF Developer contains additionally a surfactant for better wetting and easy to settle up of puddle development. AZ 400K is a buffered potassium-based developer that provides the process latitude associated with inorganic developers while minimizing risk assoc-iated with mobile ion contamination. This document provides safety information for AZ 400K developer. xlsx; Expand MNTC Rates Submenu MNTC Rates. : 7070 revision date: 11 Jun 6, 2005 · SDS management, distribution & revision solutions - for every budget. edu My Accounts AZ 400K Developer: File: AZ 5214-E Photo Resist: File: AZ nLOF 2035 PhotoResist: Developers: AZ ® 400K Developer 1:4 is the recommended developer for thick films of AZ ® 9200 photoresist. 6. It is an odorless, aqueous, inorganic, alkaline solution designed to achieve high contrast and wall profile with photoresists at high coating thicknesses, especially AZ 4500 and P 4000 series photoresists. pdf), Text File (. AZ 400K 1:4, 600 sec continuous spray @ 27 °C 0. (Hotplate) Exposure: PLA-501F（Soft contact, ghi-line aligner) Development: AZ 400K 1:4, Immersion for 300 sec. Continue rinsing. Jan 14, 2013 · While inorganic developers are not as sensitive to temperature changes as metal-ion-free developers, temperature control of ± 1°C is recommended to maintain a stable process. AZ ® 400K is a buffered po-tassium-based developer that provides the process latitude associated with inorganic developers while minimizing the risk AZ ® 10XT (520CPS) Thick photoresist for high resolution . FIRST AID MEASURES General advice : Remove soiled or soaked clothing immediately If someone exposed to the product feels unwell, contact a doctor and show this safety data sheet. AZ 421K developer is unbuffered. 0 µm -2. Chemical Properties : Odorless, aqueous, inorganic alkaline solution that is free of phospates and sodium; High speed dilution results in very high production throughput AZ® 400K Developer 1:4 Inorganic, Metal Ion Containing Developer General Information AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists. 顯影液 fhd 5(fh 6400) 7. The AZ 400K Developer is a potassium based buffered developer. Remove contact lenses, if present and easy to do. AZ® 400K Developer 1:4 Inorganic, Metal Ion Containing Developer General Information AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists. AZ 400 K Developer Substance No. Data for 25% Tetramethylammonium hydroxide solution (75-59-2) AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. The AZ ® P4000 positive resist series with its members AZ ® P4110, AZ ® P4330, AZ ® P4620 and AZ ® P4903 have two main characteristics: An improved adhesion to all common substrates for a higher stability for e. Aug 6, 2010 · Developer bath life is dependent on the amount of carbon dioxide absorbed from the air and on the amount. 8 Revision Date: 21. AZ ® 701 MIR (29CPS) is a positive resist (g-, h- and i-line sensitive) in the medium resist film thickness range, whose main applications are as a resist mask for dry etching, RIE, or lift-off processes. > MSDS access data. 70 Meister Ave. Application Notes: Development of Photoresist english Development of Photoresist german of deionized water, e. TOXICOLOGICAL INFORMATION Data for AZ 400K DEVELOPER DILUTED 1:4 Skin irritation : Species: rabbit Result: Mild skin irritation Classification: Irritating to skin. AZ® 100 Remover, TechniStrip P1316) Thinner and edge bead remover: AZ® EBR Solvent or PGMEA Developers If Safety Data Sheet (SDS) Repository. : GHSBBG7075 Version 4. Coated thickness range is approximately 1. 0 Revision Date 09/05/2014 Print Date 10/03/2014 3 / 11 rinsing. edu. pdf — PDF document , 175 KB AZ® 400K Developer 1:4 Inorganic, Metal Ion Containing Developer General Information AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists. 5% tetramethylammonium hydroxide; liquid: Due to their lower surface tension, surfactant enhanced developers improve substrate wetting and facilitate puddle formation using lower dispense volumes than typical surfactant free developers. 溶解性：与水混溶 闪点：不含可燃成分的水基材料。与灭火剂相容。 稳定性和反应性： 危险反应：稳定。 危险聚合：不会发生。 避免条件：避免与强酸接触。 AZ 400K 1:4 MIF Develop (260s spray) * Unexposed photoresist film COMPANION PRODUCTS THINNING/EDGE BEAD REMOVAL AZ® EBR Solvent or AZ EBR 70/30 DEVELOPERS AZ 400K Series, AZ 300MIF, AZ 435MIF REMOVERS AZ 300T, AZ 400T Cauchy A 1. Free access to more than 4. MSDS: Safety Data Sheet AZ® 400K 1:4 Developer AZ 400K Developer AZ 400K Developers are buffered potassium based developers that provide extended bath life in batch immersion applications and low foaming with no nozzle residue accu-mulation in spray develop processes. Key Characteristics • AZ Developer: Sodium-based buffered developer that provides optimal process control while minimizing the attack on aluminum surfaces. Optimized for the AZ 400K developers (AZ 400K 1:4 or AZ 400K 1:3) or AZ 421K developer. Somerville, NJ 08876 Common Name AZ 400K DEVELOPER Manufactured by CLARIANT 11/19/1999 (view older MSDS) Source Dolphin (DOL. MNTC Rates Effective 6-1-2023; MNTC Rates MNTC Rates Dropdown Toggle. Storage: Store in a dry place. pdf - Free download as PDF File (. 반품/교환 안내 포사이언스에서는 다음과 같은 기간 및 내용으로 상품 및 용역에 대하여 교환, 반품, 환불을 보장하고 있으며, 상품의 반환에 의한 추가비용을 고객에게 부담시키지 MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Safety Data Sheet AZ® 400K 1:4 Developer german TDS: Technical Data Sheet AZ® 400K 1:4 Developer english Information AZ® 400K 1:4 Developer english Application Notes: Development of Photoresist english Development of Photoresist german Product Properties Optimized resist adhesion to all common substrate materials Broad process parameter window for stable and reproducible litho-processes Compatible with all common developers (KOH- or TMAH-based) Compatible with all common strippers (e. Chemical Product and Company Identification 2 AZ 400K Developer 1:3 Version 4. pdf; GeSndeptestdata. "The recommended dilutions for the AZ® 400 K or AZ® 351 B for most of the processes are developer concentrate : Water = 1: . • AZ 400K developer AZ 400K Developer Overview. Development. Metal Thickness: 20µm Strip: AZ 400T COMPANION PRODUCTS Thinning/Edge Bead Removal AZ® EBR Solvent or AZ® EBR 70/30 Developers 96µm gold bump plated in AZ P4620 AZ® 400K 1:3 or 1:4, AZ® 421K, AZ Developer 1:1, AZ Cyanide electro-plating solution AZ 300 MIF DEVELOPER Substance No. The resolution potential as well as the process stability allows feature sizes close to the theoretical minimum attainable with broadband (non-DUV) resists. 正光阻 az5214e. An important selection criterion for the optimal developer is therefore the question of whether metal ion-free Jul 13, 2020 · recruit. HARD BAKE MSDS: Sicherheitsdatenblatt AZ ® 400K 1:4 Developer englisch Sicherheitsdatenblatt AZ ® 400K 1:4 Developer deutsch. 4 - 2. 6 Revision Date: 21. ※AZ 400K Developer의 국내 공급이 어려워, AZ 400K 원액을 1:4로 희석한 제품입니다. , 23 C Plating liquid: MICROFAB Cu200 (EEJA) Plating height: 7. TDS: Technical Data Sheet AZ ® 400K 1:4 Developer english Information AZ ® 400K 1:4 Developer english. 0 µm -4. Features AZ 400K DEVELOPER Substance No. The AZ ® ECI 3000 series is a modern, state-of-the-art positive resist series. Precautionary Statements : Prevention: P201 Obtain special instructions before use. Improved resolution and thermal stability vs. omniscience for all & all for one omniscience korea와 omniscience vietnam. is reduced. AZ 400K: KOH-based. wet etching or plating and a lower photo active compound All MSDS for cleanroom lab. : +1 800-515-4164 manufacturer/supplier name: clariant corporation az electronic materials p. If eye irritation persists: Get medical advice/ attention. AZ 400K Developer Diluted 1:3,5 (US) - Free SDS search (MIF) and inorganic developers (AZ Developer or AZ 400K 1:4). 10. • AZ 400K developer Mar 7, 2023 · Paired to Shipley/Microposit 1800 series resists, S1805,S1813,S1818 MSDS; Microposit CD-26: TMAH <5. 0 % , pH 13, Also 1800 series targeted, no additional surfactants. 0 to 15µm (single coat). with AZ® 100 Remover, organic solvents, or aqueous alkaline) g-, h- and i-line sensitive AZ 400K Developer; AZ P4620 Photoresist; Back to the top. Inquiry form AZ® 400K Developer 1:4 Inorganic, Metal Ion Containing Developer General Information AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists. P202 Do not handle until all safety precautions have been read and understood. B. AZ ® ECI 3012 High Resolution with Broad Process Window . in the tools and supplies, misc products category. : GHSBBG7075 Version 5. 300 MIF Developer Page 2 of 4. AZ 400K Developer Diluted 1:3 - Free SDS search Developers: AZ ® 400K Developer 1:4 is the recommended developer for thick films of AZ ® 9200 photoresist. It recommends personal protective equipment like safety eyewear and gloves when handling this product. 2 Relevant identified uses of the substance or mixture and uses advised against Use of the AZ 400 K Developer Version: 1. Method: OECD By analogy with a similar product. : 800-515-4164 Information on the substance/preparation BKNKB - AZ 400K DEVELOPER. . It lists potassium borates and potassium hydroxide as hazardous ingredients. com 1. AZ Developer Version 4. SECTION 2: Hazards identification 2. AZ 400K DEVELOPER Version 3. Common Name AZ 400K DEVELOPER Manufactured by CLARIANT 11/19/1999 (view older MSDS) Source Dolphin (DOL. chemical product and company identification ----- manufacturer/supplier name: clariant corporation az electronic materials p. Date/Time Dimensions User Comment; current: 16:54, 23 July 2012 (176 KB) Zwarburg (talk | contribs) {{MSDS}} of deionized water, e. AZ® 2026 MIF) Standard strippers (e. MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Safety Data Sheet AZ® 400K 1:4 Developer german TDS: Technical Data Sheet AZ® 400K 1:4 Developer english Information AZ® 400K 1:4 Developer english Application Notes: Development of Photoresist english Development of Photoresist german. 1200 Section 03 - Hazards identification Emergency overview: Causes severe eye irritation. 2 Relevant identified uses of the substance or mixture and uses advised against Use of the MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Safety Data Sheet AZ® 400K 1:4 Developer german TDS: Technical Data Sheet AZ® 400K 1:4 Developer english Information AZ® 400K 1:4 Developer english Application Notes: Development of Photoresist english Development of Photoresist german AZ 400K DEVELOPER Substance key: 000000500383 Version Section 01 - Product Information REVISION DATE: 02/27,'2006 Print Date: 02/27/2006 Identification of company: Trade name: ectronic Materials USA Corp. 04. MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Safety Data Sheet AZ® 400K 1:4 Developer german TDS: Technical Data Sheet AZ® 400K 1:4 Developer english Information AZ® 400K 1:4 Developer english Application Notes: Development of Photoresist english Development of Photoresist german of deionized water, e. Product Features AZ® 400K Developer 1:4 is an AZ® 400K that has already been pre-diluted for use. com Page 3 of 14 SECTION 4: First aid measures 4. AZ ® P4620 Positive Thick Resist - AZ ® P4110, AZ ® P4330, AZ ® P4903, AZ ® P4620. 2013 1 / 11 SECTION 1: Identification of the substance/mixture and of the company/undertaking 1. wet etching or plating and a lower photo active compound AZ1500 series Storage: Refrigerator - chase 2 Type: Positive Thickness Range: 0. 6 - 24µ Product Data Sheet: PDS MSDS: MSDS Developer: 1:4 AZ 400K:H2O Process: 9µm Clariant's AZ 400K is an inorganic developers are either sodium- or potassium-based developers. AZ ® 10XT is an i- and h-line (not g- line !) sensitive positive thick photoresist, as the successor to the AZ ® 9260 and is largely identical in construction, but with a different surfactant. 2020 SDS Number: 70MDGM184432 2 / 12 H361f Suspected of damaging fertility. AZ Developer 1:1 may be used in applications requiring zero etch rate on Alu-minum substrates. 00015 Sep 30, 2002 · SDS management, distribution & revision solutions - for every budget. AZ 400K Developer 1:4 Substance No. 5 million safety data sheets available online, brought to you by 3E. 70 Meister Avenue Somerville, NJ 08876, Telephone No. Complete development of patterns in thick photoresist films (> 3. Chemical Product and Company Identification 2 AZ 400K Developer AZ 400K Developers are buffered potassium based developers that provide extended bath life in batch immersion applications and low foaming with no nozzle residue accu-mulation in spray develop processes. com, a global distributor of electronics components. 03. Skip to Content. developers. Wir bieten folgende Entwickler an: AZ 326MIF, AZ 726MIF, AZ 2026MIF, MIC Developers, AZ 400K, AZ 351B, AZ 303 und AZ Developer. : 800-515-4164 Information on the substance/preparation Trade name: AZ 400K DEVELOPER (US) Material number: 184432 Chemical family: Aqueous Basic Developer Section 02 - Composition information on hazardous ingredients OSHA hazardous ingredients: None under 29 CFR 1910. 70 Meister Avenue Somerville, NJ 08876 Telephone No. louisville. 0µm) may require multiple developer puddles. 4 Emergency telephone number Please contact the regional company representation in your country. Resist: AZ P4620 Thickness: 24µm Develop: AZ 400K 1:3 Plating Temp: 45C Plating Time: 50 min. ECOLOGICAL INFORMATION Data for AZ 300 MIF DEVELOPER Additional ecological information : No ecological testing was carried out on the preparation. 2 Revision Date 04/02/2015 Print Date 10/29/2015 6 / 9 SECTION 11. , AZ® 400K developer 1:4. : GHSBBG70N4 Version 4. AZ 400K 1:4 provides improved developer selectivity for thinner films. AZ 400K Developer显影液信息 1494阅读 文档大小：42. Shorter develop times can be realized with inorganic developers, however. AZ 1500 Series. Store in a closed container. Jun 3, 2024 · AR 300-40 Developer (Allresist) AR 600-546 Developer (Allresist) AR 600-546 Photoresist (Allresist) AR SX AR-N 8250 series Developer (Allresist) AR Developer X AR 600-50/2 (Allresist) AR-PC 5090 series photoresist (Allresist) AR-P 6200 series photoresist (Allresist) AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials) AZ 400K Developer (AZ of deionized water, e. It has excellent batch-to-batch consistency. 6288 k @ 633nm 0. Flammable liquid and vapour; Serious eye irritation; May cause respiratory irritation, drowsiness, dizziness; Safety. PHOTORESIST: FOTOLACK: AZ® 10XT (220cps) EN: AZ® 10XT (220cps) DE: AZ® 400K Developer DE: AZ® 726 MIF Developer EN: AZ® 726 MIF Developer EN: 根据 AZ 400K DEVELOPER (US)文件进行翻译制作。 若发现有误，请联系微纳平台郑盼盼 2020310150@hust. com . HARD BAKE Hard baking (post develop bake) improves adhesion in wet etch or plating applications and improves pattern stability in dry etch processes. 08K 7页 hanhahong 上传于2011-11-03 格式：PDF AZ Developer, 400K, and 421K Inorganic Developers AZ ® P4110 Positive Thick Resist - AZ ® P4110, AZ ® P4330, AZ ® P4903, AZ ® P4620. SDS Database; L-Edit design; Photoresist Profiles for DRIE S1827 and AZ4620 ; AZ 400K Developer. cn. 9 - 1. P234 Keep only in original container. AZ 726 MIF Developer >95% water, 1–2. txt) or read online for free. HARD BAKE developers may be used for both spray and immersion processes. Mild agitation is recommended to achieve uniform development. 0 Product number: 697330 Date of first issue: 20. com , but for users from your part of the world, we originally designed the following web presence https://www. 8µ Product Data Sheet: AZ1505 Product Data Sheet MSDS: AZ1505, AZ1512, AZ1518 Developer: 351 Dev:H2O (1:5) Process: Recipe, Speed vs. 5995 Cauchy B (µm2) 0. 2013 Print Date 18. • In-line development applications require short development times because of equipment throughput AZ ® P4903 Positive Thick Resist - AZ ® P4110, AZ ® P4330, AZ ® P4903, AZ ® P4620. : GHSBBG7070 Version 2. AZ® 400K) or TMAH-based (e. Calcium Gluconate (Calgonate) Carbon; Carbon Dioxide; Chlorine; Chromium; Chromium Etchant CR-100; Chromium Mask Jun 29, 2012 · 内容提示： section 1. P264 Wash skin thoroughly after handling. 1 Product identifier Trade name : AZ 400 K Developer 1. • AZ 400K developer Responsible Department PM-OQR * e-mail: PM_SDS_Supply@merckgroup. Increased normality developers MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Safety Data Sheet AZ® 400K 1:4 Developer german TDS: Technical Data Sheet AZ® 400K 1:4 Developer english Information AZ® 400K 1:4 Developer english Application Notes: Development of Photoresist english Development of Photoresist german Created Date: 11/16/2007 4:11:02 PM Spray or immersion developing in AZ 400K series developers is recommended. 38 % TMAH (tetramethylammoniumhydroxide) in H2O. Product Properties Resist film thickness: 0. g. 2018 The Safety Data Sheets for catalogue items are available at www. AZ 400K Developer Diluted 1:4: AZ 400K: STOCKED . AZ® 2033 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. P337 + P313 If eye irritation persists: Get medical advice/ attention. 0um, Plating: 25 C / 30 min. AZ 400K DEVELOPER (US) Substance key: BBG7070 REVISION DATE: 08/02/2005 Version 1 Print Date: 08/02/2005 1/6 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. 02. Check part details, parametric & specs updated 20-NOV-2024and download pdf datasheet from datasheets. 300 MIF Developer. Export as PDF . Items in this series: AZ P4110 Photoresist (Quart) AZ P4110 Photoresist (Gallon) AZ P4210 Photoresist (Quart) AZ P4210 Photoresist (Gallon) AZ P4330 Photoresist (Quart) AZ P4330 Photoresist (Gallon) AZ P4400 Photoresist (Quart) AZ P4400 AZ® 400K Developer 1:4 Inorganic, Metal Ion Containing Developer General Information AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists. AZ® 421K developer is prediluted. AZ 400K Developer Diluted 1:4 - Free SDS search Bestellen Sie bei uns metal-ion-free (MIF) Developer oder metal-ion-containing (MIC) Developer für Ihren Prozess. Anwendungshinweis: Entwicklung von Fotolack englisch Entwicklung von Fotolack deutsch AZ 400K Developer : Developer that is compatible with batch and in-line spray developing processes. 1 Description of first aid measures General advice : First aider needs to protect himself. Coated thickness range is approximately 5. 3 µm Steep wall profiles, high aspect ratios Sensitive to g-, h-, and i-line Recommended developers: KOH-based (e. AZ Developer 1:1 may be used in applications requiring zero etch rate on Aluminum substrates. 2020 SDS Number: 70MDGM184433 2 / 10 Precautionary Statements : Prevention: P201 Obtain special instructions before use. PRODUCT AND COMPANY IDENTIFICATION Product name : AZ 400K DEVELOPER Product Use Description : Intermediate for electronic industry Company : AZ Electronic Materials USA Corp. • AZ 400K developer AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications. thickness AZ 10 XT Storage: Refrigerator - chase 2 Type: Positive Thickness Range: 4. AZ 400K 1:4 or AZ 300MIF developer is recommended for tank immersion processing and AZ 917MIF is recommended for pud-dle developing. AZ 400K Developers are available in multiple dilu- Jul 23, 2012 · Click on a date/time to view the file as it appeared at that time. An alternative sodium-based developer, AZ az 400k developer diluted 1 4-e20150519 msds eng 4. Research. 800-5154134 Information on time substance/preparation Product safety: 908-429-3562 ganic (Sodium or Potassium based) developers. 2017 Print Date: 05. AZ 400K Series Developers are buffered potassium based developers designed for extended bath life in immersion develop process environments. 0 Revision Date 05/29/2015 Print Date 05/29/2015 7 / 10 SECTION 12. 顯影液 az 300mif developer(az 6112) 8. Plating bath lives are maximized thanks to P4620's unique PAC chemistry which prevents leaching of the DNQ. 0 µm (Development) Cu plating Resist Stripping Plating process condition Photoresist thickness: 15um, Prebake: 110C/180 sec. box 3700, 70 meister avenue somerville, nj 08876-1258 telephone numbers: emergency-chemtrec: (800) 424-9300 product safety information: (908) 429-3593 customer service: (800) 515-4164 product name: az(r) 400k developer synonyms: none msds no. Compatible with AZ 400K Developer, AZ 726 MIF Developer; Hazards. C. emdgroup. Production. ldubrou icl dnvx kpzkh fiktxx hoh nmcr edmikupx gzh ncljcv qcheri lxredf kmgn jdl kfkog